Metara in the News
June 13, 2006 - Solid State Technology
Automated mass spectrometry to detect impurities in harsh acid chemistries
An automated, in-line mass-spectrometry
(ILMS) system using basic time-of-flight principles
has been developed that can detect part-per-trillion
contamination levels of metals in harsh acid chemistries.
Special hardware and software are needed to handle
concentrated hydrofluoric, hydrochloric, sulfuric,
and phosphoric acids. Prior control strategies
relied on slow and imprecise manual sampling using
off-line instrumentation. The in-line system can
automatically test samples from up to five different
locations in the chemical management/distribution
system, providing the information needed to respond
to both routine variations and extreme contamination
events.
 read more on the publication's Web site
June 2006 - Solid State Technology
Volume: 49 Issue: 6
Metara Inc.
featured in latest issue
cover article.
read more on the publication's Web site
June 8, 2006 - Semiconductor International
Metara Makes Preemptive Strike on Harsh Chemicals
Metara
Inc. a provider of in-line chemical metrology tools to monitor and
control chemical processes Wednesday rolled out its Sentry Harsh
Chemistry Metrology (HCM) system that the company claims is the first
automated, real-time, proactive analysis solution for harsh chemistries
used in semiconductor manufacturing processes.
read more on the publication's Web site
June 8, 2006 - Electronic Business
Metara Makes Preemptive Strike on Harsh Chemicals
Metara
Inc. a provider of in-line chemical metrology tools to monitor and
control chemical processes Wednesday rolled out its Sentry Harsh
Chemistry Metrology (HCM) system that the company claims is the first
automated, real-time, proactive analysis solution for harsh chemistries
used in semiconductor manufacturing processes.
read more on the publication's Web site
June 8, 2006 - Electronic News
Metara Makes Preemptive Strike on Harsh Chemicals
Metara
Inc. a provider of in-line chemical metrology tools to monitor and
control chemical processes Wednesday rolled out its Sentry Harsh
Chemistry Metrology (HCM) system that the company claims is the first
automated, real-time, proactive analysis solution for harsh chemistries
used in semiconductor manufacturing processes.
read more on the publication's Web site
June 7, 2006 - EE Times
Metara's metrology tool spots harsh defects
Metara
Inc. rolled out what the chip-equipment company claims as the
industry’s first real-time metrology tool for use in monitoring harsh
chemistries in the manufacturing process.
read more on the publication's Web site
June 7, 2006 - The Semiconductor Reporter
New type of system keeps tabs on contaminants in harsh acid chemistries
In-line
chemical metrology system supplier Metara Inc. today introduced what it
said is the first automated, real-time contaminant analysis system for
harsh chemistries used in today's manufacturing processes.
read more on the publication's Web site
June 7 , 2006 - Semiconductor Fabtech
New Product:
Metara’s
new automated SENTRY analyses harsh chemistries in fab
Metara
has introduced the 'SENTRY' Harsh Chemistry Metrology (HCM) system that
the company claims is the first of its kind to be able in fully
automated mode to analyze harsh ultra-pure chemicals for metallic
contamination excursions.
read more on the publication's Web site
May 8, 2006 - First Albany Capital - Semiconductors and Enabling Technology, Auguste Richard, Managing Director
Industry Update: An Ounce of Prevention Is Worth a Pound of Cure;
New Process Control Paradigm
Why
Post Process Inspection Is Entering a State of Decline….To be clear, we
believe semiconductor companies require more process control, not less.
However, in our view, most semiconductor companies are not really
engaged in process control, but rather primarily use a layer-by-layer
post-process quality control. That is to say that after a process step
is completed, the wafer is inspected for mis-processing, random defects
and out-of-control parameters, such as variation in film thickness or
etch uniformity. This version of process control is fundamentally
flawed. First, post-process inspections only catches yield loss after
processing has occur red. Second, with each successive node, the cost
and complexity of finding a defect and precisely measuring a control
parameter is increasing. Further more, the number of inspections
increases as process complexity increases. …… According to one industry
contact in reference to bright field defect inspection: "There are no
viable technologies that can support the scaling of high volume visual
inspection to levels beyond what has already been achieved. ….Proactive
process control that avoids the formation of defects is the only viable
way to go."
read more
April 27, 2006 - EE Times
updates list of emerging startups
Metara has been added to the
EE Times list of the top 60 emerging technology
companies, the Silicon 60. The EE Times editors have selected companies
based on a mix of criteria including: technology, intended market,
maturity, financial position and investment profile. Startups on the
Silicon 60 list include companies ... that made an impression on EE Times
editors. They are emerging companies to watch for a wide variety of reasons.
read more on the publication's Web site
December 2005 - Micro
Magazine
Greatest Hits of 2005
In-Line Chemical Metrology
System — The Sentry platform is a production-worthy in-line
chemical metrology system that determines chemical composition and
potential yield- or process-limiting defects..
read more on the publication's Web site
November 15, 2005 - EE
Times
Startup Metara receives $11.5 million in funding
SAN FRANCISCO —
Inline chemical metrology player Metara Inc. said Tuesday (Nov. 14)
that it has completed an $11.5 million series E funding rounding. The
company said it plans to use the additional funding to fund the market
expansion phase of its metrology technology.
read more on the publication's Web site
November 15, 2005 - Fab
Tech
Metara raises capital for sales & field support expansion
Metara Inc., has raised $11.5
million US dollars in a Series E round of funding from its initial VC
backers. VantagePoint Venture Partners and Cipio Partners provided the
capital to help support the company increase sales channels and support
services due to the continued adoption of the company's unique inline
chemical analysis tools.
read more on the publication's Web site
July, 2005 - MICRO Magazine
INDUSTRY NEWS -- Special Report
launches of companies such as
... Metara... prove that equipment and software start-ups can flourish.
read more on the publication's Web site
July 12, 2005 - WaferNews
Startups show off new technologies at SEMICON West
...Metara, Sunnyvale, CA, has
automated mass spectrometry for real-time monitoring of wet process
chemicals. "The fab is just a big chemical process, but no one has
measured chemicals in real time for process optimization," said VP and
CTO Robert McDonald.
read more on the publication's Web site
July 12, 2005 - Electronic
News
Armageddon? Nope, just another SEMICON West
SAN FRANCISCO, Calif. - Well,
here we are again, the time of year that I dread the most. The week
that hangs over my head like a gallows. The period of the summer that
contains my annual götterdämmerung. Semicon West is
upon us.
read more on the publication's Web site
June 13, 2005 - EE Times
Startup Metara Rolls Tools for Compositional Metrology
SAN JOSE, Calif. - After
keeping a low profile for several years, chip-equipment startup Metara
Inc. is expected to burst on the scene Monday (June 13) and roll out a
pair of machines for the emerging compositional metrology market.
read more on the publication's Web site
June 13, 2005 - Electronic
News
Startup Offers Inline Chemical Metrology
A Silicon Valley startup says
it is poised to take advantage of a heretofore untapped and yet
increasingly important market: in-line chemical metrology.
read more on the publication's Web site
June 2005 - MICRO Magazine
SEMICON West 2005 Product Preview
In-Line Chemical Metrology System
The Sentry platform is a
production-worthy in-line chemical metrology system that determines
chemical composition and potential yield- or process-limiting defects.
read more on the publication's Web site
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